Room-temperature and low-pressure nanoimprint lithography

A. Lebib, Y. Chen, E. Cambril, P. Youinou, V. Studer, M. Natali, A. Pépin, H.M. Janssen, R.P. Sijbesma
Microelectronic Engineering. 2002-07-01; 61-62: 371-377
DOI: 10.1016/S0167-9317(02)00485-9

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